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hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a

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    Buy cheap hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a from wholesalers
     
    Buy cheap hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a from wholesalers
    • Buy cheap hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a from wholesalers
    • Buy cheap hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a from wholesalers
    • Buy cheap hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a from wholesalers

    hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a

    Ask Lasest Price
    Brand Name : TK MATERILA
    Model Number : 1-3mm,99.99%
    Price : USD300
    Payment Terms : T/T
    Supply Ability : 500kgs per day
    Delivery Time : 10days
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    hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a

    Hafnium oxide, HFO2, hafnium oxide, hafnium oxide, optical coating materials,high purity hafnium oxide sintering
    Chemical name: HFO2
    Appearance: white
    Molecular weight: 210.49
    Density: 9.7g/cm³
    Melting point: 2500℃
    Refractive index (wavelength /nm): 1.9-2.1 (300)
    1.84-2.0 (2500)
    Boiling point: 5400℃
    Linear expansion coefficient: 5.8 * 10-6/ C (250-1300)
    10's 4 vacuum evaporation temperature: 2500℃
    Evaporation mode: electron beam
    Transparent band /nm:235-2500
    Dielectric constant: 20.5-23
    Volume: 0.05μF/cm2
    Capacitance temperature coefficient TCC:(1.25~2.50)×10-4/℃
    Performance: suitable for evaporation of electron gun, film densification and stability. Excellent material for ultraviolet band. Does not dissolve in water, resistant to chemical properties, but at high temperatures can react with the hydroxide, the film is hard;

    Application: it is mainly used in the ultraviolet film, anti - Anti - film or high - back - film and fire - resistant material, UV - near - infrared multilayer film.

    HfO2 thin film is a kind of insulating oxide, can make the film resistance, but also can be used as a film, the general use of sputtering deposition.

    Quality hafnium oxide (HFO2) film material,1-3mm,99.99% used in the ultraviolet film, anti - Anti - film or high - back - film a for sale
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